PHILADELPHIA--(BUSINESS WIRE)-- Following the introduction of its IKONIC™ chemical mechanical planarization (CMP) polishing pad platform in late 2012, Dow Electronic Materials, a business unit of The ...

PHILADELPHIA--(BUSINESS WIRE)--Dow Electronic Materials, a business unit of The Dow Chemical Company (NYSE:DOW), today introduced its new IKONIC™ polishing pad platform, bringing to market Dow’s most ...

Chemical Mechanical Planarization (CMP) is a critical process in the semiconductor, LED wafer, and hard disk manufacturing industry and is used to achieve the substrate wafer's required planarity.

AURORA, Ill., Oct. 20, 2010 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing ...

Thomas West Inc. (TWI) introduced a hard chemical mechanical planarization (CMP) pad today that will put the small, privately owned Sunnyvale, Calif.-based company up against Rodel Inc., a company ...

(MENAFN- Ameliorate Digital Consultancy) The global CMP Slurry and Pads market is valued at USD 1.56 billion in 2023. It is expected to reach USD 2.13 billion in 2028, witnessing a CAGR of 6.43% ...

SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced its innovative Applied DuraPad ™ CMP polishing pad technology for 200mm chemical mechanical planarization (CMP) systems.

Thomas West Inc.’s Right Pad 711 CMP pad magnified 100 times. Silicon Valley start-up Thomas West Inc. (TWI) recently took the wraps off its entry into the market for chemical mechanical planarization ...

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The CMP pads market is expanding as a result of semiconductor foundries' global development, especially in emerging economies. The need for CMP pads to support semiconductor production facilities is ...